Invention Grant
US07793414B2 Methods for forming connection structures for microelectronic devices
有权
用于形成微电子器件的连接结构的方法
- Patent Title: Methods for forming connection structures for microelectronic devices
- Patent Title (中): 用于形成微电子器件的连接结构的方法
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Application No.: US11642570Application Date: 2006-12-20
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Publication No.: US07793414B2Publication Date: 2010-09-14
- Inventor: Belgacem Haba , Masud Beroz , David B. Tuckerman , Giles Humpston , Richard Dewitt Crisp
- Applicant: Belgacem Haba , Masud Beroz , David B. Tuckerman , Giles Humpston , Richard Dewitt Crisp
- Applicant Address: US CA San Jose
- Assignee: Tessera, Inc.
- Current Assignee: Tessera, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: H01R9/00
- IPC: H01R9/00 ; H01R12/04

Abstract:
Provided are connection structures for a microelectronic device and methods for forming the structure. A substrate is included having opposing surfaces and a plurality of holes extending through the surfaces. Also included is a plurality of electrically conductive posts. Each post extends from a base to a tip located within a corresponding hole of the substrate. An additional substrate may be provided such that the base of each post is located on a surface thereof. Additional electrically conductive posts may be provided having tips in corresponding holes of the additional substrate. Optionally, a dielectric material may be placed between the substrate and the posts.
Public/Granted literature
- US20070094874A1 Methods for forming connection structures for microelectronic devices Public/Granted day:2007-05-03
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