Invention Grant
- Patent Title: Methods for generating sublithographic structures
- Patent Title (中): 用于生成亚光刻结构的方法
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Application No.: US11754813Application Date: 2007-05-29
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Publication No.: US07794614B2Publication Date: 2010-09-14
- Inventor: Rolf Weis , Christoph Noelscher
- Applicant: Rolf Weis , Christoph Noelscher
- Applicant Address: DE Munich
- Assignee: Qimonda AG
- Current Assignee: Qimonda AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
One possible embodiment is a method of manufacturing a structure on or in a substrate with the following steps a) positioning at least one spacer structure by a spacer technique on the substrate, b) using at least one of the groups of the spacer structure and a structure generated by the spacer structure as a mask for a subsequent particle irradiation step for generating a latent image in the substrate c) using the latent image for further processing the substrate.
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