Invention Grant
- Patent Title: Film formation method, electro-optical device manufacturing method and electronic apparatus
- Patent Title (中): 成膜方法，电光装置的制造方法和电子装置
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Application No.: US11333707Application Date: 2006-01-17
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Publication No.: US07794781B2Publication Date: 2010-09-14
- Inventor: Kei Hiruma
- Applicant: Kei Hiruma
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2005-013722 20050121
- Main IPC: B05D5/12
- IPC: B05D5/12
Abstract:
A film formation method includes: ejecting liquid onto a substrate; and drying the liquid ejected onto the substrate by a drying device before an amount of a solvent evaporation of the liquid exceeds 40%.
Public/Granted literature
- US20060164591A1 Film formation method, electro-optical device manufacturing method and electronic apparatus Public/Granted day:2006-07-27
Information query
