Invention Grant
US07794900B2 Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate 有权
掩模空白基板的制造方法,掩模坯料的制造方法,掩模制造方法以及掩模基板

  • Patent Title: Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
  • Patent Title (中): 掩模空白基板的制造方法,掩模坯料的制造方法,掩模制造方法以及掩模基板
  • Application No.: US12632900
    Application Date: 2009-12-08
  • Publication No.: US07794900B2
    Publication Date: 2010-09-14
  • Inventor: Yasushi Okubo
  • Applicant: Yasushi Okubo
  • Applicant Address: JP Tokyo
  • Assignee: Hoya Corporation
  • Current Assignee: Hoya Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2007-204922 20070807
  • Main IPC: G03F9/00
  • IPC: G03F9/00
Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
Abstract:
An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.
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