Invention Grant
US07794900B2 Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
有权
掩模空白基板的制造方法,掩模坯料的制造方法,掩模制造方法以及掩模基板
- Patent Title: Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
- Patent Title (中): 掩模空白基板的制造方法,掩模坯料的制造方法,掩模制造方法以及掩模基板
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Application No.: US12632900Application Date: 2009-12-08
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Publication No.: US07794900B2Publication Date: 2010-09-14
- Inventor: Yasushi Okubo
- Applicant: Yasushi Okubo
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-204922 20070807
- Main IPC: G03F9/00
- IPC: G03F9/00

Abstract:
An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.
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