Invention Grant
- Patent Title: Chemically amplified positive resist composition
- Patent Title (中): 化学放大正光刻胶组合物
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Application No.: US12121458Application Date: 2008-05-15
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Publication No.: US07794913B2Publication Date: 2010-09-14
- Inventor: Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
- Applicant: Makoto Akita , Masumi Suetsugu , Kazuhiko Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-132614 20070518
- Main IPC: G03F7/004
- IPC: G03F7/004
Abstract:
A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): (ii) a polymerization unit represented by the formula (II): and (iii) at least one polymerization unit selected from the group consisting of a polymerization unit represented by the formula (III): and a polymerization unit represented by the formula (IV): and (B) at least one acid generator.
Public/Granted literature
- US20080286691A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION Public/Granted day:2008-11-20
Information query
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