Invention Grant
- Patent Title: Chemically amplified positive resist composition
- Patent Title (中): 化学放大正光刻胶组合物
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Application No.: US11705138Application Date: 2007-02-12
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Publication No.: US07794914B2Publication Date: 2010-09-14
- Inventor: Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
- Applicant: Nobuo Ando , Yusuke Fuji , Ichiki Takemoto
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Priority: JP2006-037624 20060215
- Main IPC: G03F7/039
- IPC: G03F7/039
Abstract:
The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group, a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, and an acid generator.
Public/Granted literature
- US20070218401A1 Chemically amplified positive resist composition Public/Granted day:2007-09-20
Information query
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