Invention Grant
- Patent Title: Method for manufacturing optical element
- Patent Title (中): 光学元件制造方法
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Application No.: US12426425Application Date: 2009-04-20
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Publication No.: US07795058B2Publication Date: 2010-09-14
- Inventor: Tatsuro Uchida
- Applicant: Tatsuro Uchida
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-051945 20060228
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention provides an optical element which can reliably acquire a difference of refractive indices between a member under a photonic crystal layer and the crystal layer without using such a stacking technique as in conventional processes; a method for manufacturing the optical element; and a semiconductor laser device with the use of the optical element. The optical element has the first layer 500 and the second layer 400 formed on a substrate 100, wherein the second layer includes pores and has a refractive-index periodically changing structure in which a refractive index periodically changes in an in-plane direction; and the first layer has an oxidized region with a lower refractive index than the refractive index of the second layer, in a lower side of the pores of the second layer.
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