Invention Grant
- Patent Title: Method of forming a pressure switch thin film device
- Patent Title (中): 形成压力开关薄膜装置的方法
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Application No.: US11696079Application Date: 2007-04-03
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Publication No.: US07795062B2Publication Date: 2010-09-14
- Inventor: Carl P. Taussig , Ping Mei , Hao Luo , Warren Jackson
- Applicant: Carl P. Taussig , Ping Mei , Hao Luo , Warren Jackson
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
This invention provides a method of forming at least one pressure switch thin film device. The method includes providing a substrate and depositing a plurality of thin film device layers as a stack upon the substrate. An imprinted 3D template structure is provided upon the plurality of thin film device layers. The plurality of thin film device layers and the 3D template structure are then etched and at least one thin film device layer is undercut to provide a plurality of aligned electrical contact pairs and adjacent spacer posts. A flexible membrane providing a plurality of separate electrical contacts is deposited upon the spacer posts, the separate electrical contacts overlapping the contact pairs. The spacer posts provide a gap between the electrical contacts and the contact pairs.
Public/Granted literature
- US20080248605A1 METHOD OF FORMING A PRESSURE SWITCH THIN FILM DEVICE Public/Granted day:2008-10-09
Information query
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