Invention Grant
- Patent Title: Recessed gate dielectric antifuse
- Patent Title (中): 嵌入式栅介质反熔丝
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Application No.: US10933161Application Date: 2004-09-02
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Publication No.: US07795094B2Publication Date: 2010-09-14
- Inventor: Dwayne Kreipl
- Applicant: Dwayne Kreipl
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L21/3205

Abstract:
A recessed dielectric antifuse device includes a substrate and laterally spaced source and drain regions formed in the substrate. A recess is formed between the source and drain regions. A gate and gate oxide are formed in the recess and lightly doped source and drain extension regions contiguous with the laterally spaced source and drain regions are optionally formed adjacent the recess. Programming of the recessed dielectric antifuse is performed by application of power to the gate and at least one of the source region and the drain region to breakdown the dielectric, which minimizes resistance between the gate and the channel.
Public/Granted literature
- US20060046354A1 Recessed gate dielectric antifuse Public/Granted day:2006-03-02
Information query
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