Invention Grant
- Patent Title: Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment
- Patent Title (中): 半导体装置及其制造方法,电路基板,电光装置和电子设备
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Application No.: US11456354Application Date: 2006-07-10
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Publication No.: US07795129B2Publication Date: 2010-09-14
- Inventor: Haruki Ito
- Applicant: Haruki Ito
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2002-350337 20021202
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions.
Public/Granted literature
Information query
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