Invention Grant
US07795129B2 Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment 有权
半导体装置及其制造方法,电路基板,电光装置和电子设备

  • Patent Title: Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment
  • Patent Title (中): 半导体装置及其制造方法,电路基板,电光装置和电子设备
  • Application No.: US11456354
    Application Date: 2006-07-10
  • Publication No.: US07795129B2
    Publication Date: 2010-09-14
  • Inventor: Haruki Ito
  • Applicant: Haruki Ito
  • Applicant Address: JP
  • Assignee: Seiko Epson Corporation
  • Current Assignee: Seiko Epson Corporation
  • Current Assignee Address: JP
  • Agency: Harness, Dickey & Pierce, P.L.C.
  • Priority: JP2002-350337 20021202
  • Main IPC: H01L21/44
  • IPC: H01L21/44
Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment
Abstract:
A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions.
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