Invention Grant
US07795597B2 Deflector array, exposure apparatus, and device manufacturing method 有权
偏转器阵列,曝光装置和装置制造方法

Deflector array, exposure apparatus, and device manufacturing method
Abstract:
A deflector array in which a plurality of deflectors, which deflect charged particle beams, are arrayed on a substrate. The plurality of deflectors include respective openings different from each other formed on the substrate. Each of the plurality of deflectors includes a pair of electrodes opposing each other through a corresponding opening, and the plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors which are located nearest to each other.
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