Invention Grant
US07795597B2 Deflector array, exposure apparatus, and device manufacturing method
有权
偏转器阵列,曝光装置和装置制造方法
- Patent Title: Deflector array, exposure apparatus, and device manufacturing method
- Patent Title (中): 偏转器阵列,曝光装置和装置制造方法
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Application No.: US11779498Application Date: 2007-07-18
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Publication No.: US07795597B2Publication Date: 2010-09-14
- Inventor: Kenichi Nagae , Masatoshi Kanamaru
- Applicant: Kenichi Nagae , Masatoshi Kanamaru
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Canon Kabushiki Kaisha,Hitachi High-Technologies Corporation
- Current Assignee: Canon Kabushiki Kaisha,Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2006-197747 20060720
- Main IPC: G21K1/087
- IPC: G21K1/087

Abstract:
A deflector array in which a plurality of deflectors, which deflect charged particle beams, are arrayed on a substrate. The plurality of deflectors include respective openings different from each other formed on the substrate. Each of the plurality of deflectors includes a pair of electrodes opposing each other through a corresponding opening, and the plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors which are located nearest to each other.
Public/Granted literature
- US20080017807A1 DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-01-24
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