Invention Grant
- Patent Title: Curled semiconductor transistor
- Patent Title (中): 卷曲半导体晶体管
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Application No.: US11727955Application Date: 2007-03-29
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Publication No.: US07795647B2Publication Date: 2010-09-14
- Inventor: Garrett A. Storaska , Robert S. Howell , Harvey C. Nathanson , Francis William Hopwood
- Applicant: Garrett A. Storaska , Robert S. Howell , Harvey C. Nathanson , Francis William Hopwood
- Applicant Address: US CA Los Angeles
- Assignee: Northrop Grumman Systems Corporation
- Current Assignee: Northrop Grumman Systems Corporation
- Current Assignee Address: US CA Los Angeles
- Agency: Andrews Kurth LLP
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
A curled transistor comprises a coiled semiconductor substrate having a plurality of concentrically curled layers. Source and drain regions are configured on a portion of the coiled semiconductor substrate, and a gate dielectric is positioned between the source and drain regions. A first set of metallic contacts electrically couple to the source region on the coiled semiconductor substrate and a second set of metallic contacts electrically couple to the drain region on the coiled semiconductor substrate.
Public/Granted literature
- US20070284633A1 Curled semiconductor transistor Public/Granted day:2007-12-13
Information query
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