Invention Grant
- Patent Title: Mask haze early detection
- Patent Title (中): 面罩雾霭早期检测
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Application No.: US11866514Application Date: 2007-10-03
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Publication No.: US07796249B2Publication Date: 2010-09-14
- Inventor: Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
- Applicant: Wen-Chuan Wang , Shy-Jay Lin , Te-Chih Huang , Chih-Ming Ke , Wei-Yu Su , Heng-Hsin Liu , Tsai-Sheng Gau , Chin-Hsiang Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
Detecting haze formation on a mask by obtaining an optical property of the mask and determining progress of the haze formation based on the obtained optical property.
Public/Granted literature
- US20090063074A1 Mask Haze Early Detection Public/Granted day:2009-03-05
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