Invention Grant
US07796416B2 Variable resistance element, its manufacturing method and semiconductor memory device comprising the same
有权
可变电阻元件,其制造方法和包括该可变电阻元件的半导体存储器件
- Patent Title: Variable resistance element, its manufacturing method and semiconductor memory device comprising the same
- Patent Title (中): 可变电阻元件,其制造方法和包括该可变电阻元件的半导体存储器件
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Application No.: US12092766Application Date: 2006-12-13
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Publication No.: US07796416B2Publication Date: 2010-09-14
- Inventor: Kazuya Ishihara , Yasunari Hosoi , Shinji Kobayashi
- Applicant: Kazuya Ishihara , Yasunari Hosoi , Shinji Kobayashi
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Nixon & Vanderhye P.C.
- Priority: JP2005-375852 20051227
- International Application: PCT/JP2006/324802 WO 20061213
- International Announcement: WO2007/074642 WO 20070705
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
Provided is a variable resistance element capable of performing a stable resistance switching operation and having a favorable resistance value retention characteristics, comprising a variable resistor 2 sandwiched between a upper electrode 1 and lower electrode 3 and formed of titanium oxide or titanium oxynitride having a crystal grain diameter of 30 nm or less. When the variable resistance 2 is formed under the substrate temperature of 150° C. to 500° C., an anatase-type crystal having a crystal grain diameter of 30 nm or less is formed. Since the crystalline state of the variable resistor changes by applying a voltage pulse and the resistance value changes, no forming process is required. Moreover, it is possible to perform a stable resistance switching operation and obtain an excellent effect that the resistance fluctuation is small even if the switching is repeated, or the variable resistance element is stored for a long time under a high temperature.
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