Invention Grant
US07798096B2 Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
有权
等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
- Patent Title: Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool
- Patent Title (中): 等离子体，紫外线和离子/中性辅助ALD或CVD在批量工具中
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Application No.: US11381970Application Date: 2006-05-05
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Publication No.: US07798096B2Publication Date: 2010-09-21
- Inventor: Maitreyee Mahajani , Joseph Yudovsky , Brendan McDougall
- Applicant: Maitreyee Mahajani , Joseph Yudovsky , Brendan McDougall
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing and may include plasma, UV, or ion assistance.
Public/Granted literature
- US20070259110A1 PLASMA, UV AND ION/NEUTRAL ASSISTED ALD OR CVD IN A BATCH TOOL Public/Granted day:2007-11-08
Information query
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