- Patent Title: Process for manufacturing plasma display panel and substrate holder
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Application No.: US11640341Application Date: 2006-12-18
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Publication No.: US07798880B2Publication Date: 2010-09-21
- Inventor: Michihiko Takase , Jun Shinozaki , Hiroyuki Furukawa
- Applicant: Michihiko Takase , Jun Shinozaki , Hiroyuki Furukawa
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Steptoe & Johnson LLP
- Priority: JP2003-039319 20030218
- Main IPC: H01J17/49
- IPC: H01J17/49 ; H01J9/24 ; H01K1/18

Abstract:
The invention relates to a process for manufacturing plasma display panel and a substrate holder, preventing an occurrence of dust giving an unfavorable effect in a forming process of a film on a substrate of a plasma display panel in a film forming apparatus. When forming the film, a substrate (3) and a dummy substrate (35) are held by a first substrate holder (31) composed of a supporter sustaining underneath the substrate and a restrictor restricting a position of the substrates (3) in a plane direction, and a second substrate holder (32) sustaining the first substrate holder (31).
Public/Granted literature
- US20070275625A1 Process for manufacturing plasma display panel and substrate holder Public/Granted day:2007-11-29
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