Invention Grant
- Patent Title: System and method for processing high purity materials
- Patent Title (中): 用于加工高纯度材料的系统和方法
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Application No.: US11778806Application Date: 2007-07-17
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Publication No.: US07799115B2Publication Date: 2010-09-21
- Inventor: David Kandiyeli , Todd Graves , Rhey Yang
- Applicant: David Kandiyeli , Todd Graves , Rhey Yang
- Applicant Address: US OR Tualatin
- Assignee: Mega Fluid Systems, Inc.
- Current Assignee: Mega Fluid Systems, Inc.
- Current Assignee Address: US OR Tualatin
- Agency: Scheinberg & Griner, LLP
- Agent David Griner; Robert McMinn
- Main IPC: B01D46/46
- IPC: B01D46/46

Abstract:
Systems and methods for processing high purity materials are disclosed. A unit operation processes a material stream, an operational parameter of the unit operation is monitored, and a standby unit is charged with pressurized gas to achieve system pressure. The material stream is diverted to the standby unit in response to the operational parameter of the unit operation registering a threshold value. Flow exiting the standby unit is first vented via an outlet, and then directed toward a point of use after the pressurized gas has been purged. The unit operation may then be serviced and subsequently brought back online. A second unit operation may process a second material stream simultaneously, and the second material stream may be periodically diverted to the standby unit in like manner, thus reducing line pressure variation. The disclosed method may be performed manually or implemented automatically through use of a controller.
Public/Granted literature
- US20080011661A1 SYSTEM AND METHOD FOR PROCESSING HIGH PURITY MATERIALS Public/Granted day:2008-01-17
Information query
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