Invention Grant
- Patent Title: Method for the growth of semiconductor ribbons
- Patent Title (中): 半导体带的生长方法
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Application No.: US11578378Application Date: 2004-04-15
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Publication No.: US07799131B2Publication Date: 2010-09-21
- Inventor: António Vallêra , João Serra , Jorge Maia Alves , Miguel Brito , Roberto Gamboa , João Henriques
- Applicant: António Vallêra , João Serra , Jorge Maia Alves , Miguel Brito , Roberto Gamboa , João Henriques
- Applicant Address: PT Lisbon
- Assignee: Faculdade de Ciencias Da Universidade de Lisboa
- Current Assignee: Faculdade de Ciencias Da Universidade de Lisboa
- Current Assignee Address: PT Lisbon
- Agency: Sughrue Mion, PLLC
- International Application: PCT/PT2004/000007 WO 20040415
- International Announcement: WO2005/100644 WO 20051027
- Main IPC: C30B13/00
- IPC: C30B13/00

Abstract:
The present invention provides a method for the continuous production of semiconductor ribbons by growth from a linear molten zone. The creation of the molten zone is achieved by application of an electric current, direct or alternating, parallel to the surface of the ribbon and perpendicular to the direction of growth, and intense enough to melt the said material, preferably using electrodes of the said material. The molten zone is fed by transference of the material, in the liquid state, from one or more reservoirs, where melting of the feedstock occurs. Preferably, the said electrodes and the said reservoir(s) are only constituted by the said material, thus avoiding contamination by foreign materials. The present invention is applicable, for example, in the industry of silicon ribbons production for photovoltaic application.
Public/Granted literature
- US20070241481A1 Method for the Growth of Semiconductor Ribbons Public/Granted day:2007-10-18
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