Invention Grant
US07799304B2 Highly-structured silica having a low water uptake, preparation method thereof and uses of same
有权
具有低吸水率的高度结构的二氧化硅,其制备方法和用途
- Patent Title: Highly-structured silica having a low water uptake, preparation method thereof and uses of same
- Patent Title (中): 具有低吸水率的高度结构的二氧化硅,其制备方法和用途
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Application No.: US10583417Application Date: 2004-12-20
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Publication No.: US07799304B2Publication Date: 2010-09-21
- Inventor: Adrien Dromard , Yvonick Chevallier , Rémi Valero , Dominique Petit
- Applicant: Adrien Dromard , Yvonick Chevallier , Rémi Valero , Dominique Petit
- Applicant Address: FR Aubervilliers
- Assignee: Rhodia Chimie
- Current Assignee: Rhodia Chimie
- Current Assignee Address: FR Aubervilliers
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: FR0315063 20031219; FR0403700 20040408
- International Application: PCT/FR2004/003313 WO 20041220
- International Announcement: WO2005/061384 WO 20050707
- Main IPC: C01B33/12
- IPC: C01B33/12

Abstract:
The invention relates to a highly-structured precipitated silica having a low water uptake and high dispersibility in different pasty or solid matrices or media, elastomers or silicon, and to the preparation method thereof. The invention also relates to the use of said silica, for example, as a reinforcing filler in matrices based on elastomers (clear or semi-clear for shoe soles), in silicon matrices (in particular, for the coating of electric cables), as a filler and/or support and/or vehicle in different compositions (food compositions, cosmetic compositions, pharmaceutical compositions, compositions for the production of paints or paper, compositions for the production of porous membrane separators for batteries) or as a thickening agent in toothpastes.
Public/Granted literature
- US20080019898A1 Highly-Structured Silica Having a Low Water Uptake, Preparation Method Thereof and Uses of Same Public/Granted day:2008-01-24
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