Invention Grant
- Patent Title: Method of purifying metallurgical silicon by directional solidification
- Patent Title (中): 通过定向凝固纯化冶金硅的方法
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Application No.: US12311777Application Date: 2007-11-02
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Publication No.: US07799306B2Publication Date: 2010-09-21
- Inventor: Florence Servant , Denis Camel , Beatrice Drevet
- Applicant: Florence Servant , Denis Camel , Beatrice Drevet
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Oliff & Berridge, PLC
- Priority: FR0609584 20061102
- International Application: PCT/FR2007/001818 WO 20071102
- International Announcement: WO2008/065270 WO 20080605
- Main IPC: C01B33/02
- IPC: C01B33/02

Abstract:
The method enables metallurgical silicon to be purified by directional solidification to obtain solar or photovoltaic grade silicon. A crystallization step uses at least one silicon seed, preference of solar grade or even microelectronic grade, having for example a purity substantially equal to or greater than a predetermined purity of the solar-grade silicon. The silicon seed which covers the bottom of the crucible can come from a previous crystallization or be formed by a silicon wafer. The use of a single-crystal or textured multi-crystal seed enables crystallographic orientation of the solar-grade silicon. An intermediate layer of solid metallurgical silicon can be arranged on the silicon seed and a metallurgical silicon feedstock is arranged on the intermediate layer.
Public/Granted literature
- US20100003183A1 Method of purifying metallurgical silicon by directional solidification Public/Granted day:2010-01-07
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