Invention Grant
- Patent Title: Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
- Patent Title (中): 感光组合物，用于感光组合物的化合物和使用感光组合物的图案形成方法
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Application No.: US11876945Application Date: 2007-10-23
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Publication No.: US07799505B2Publication Date: 2010-09-21
- Inventor: Kunihiko Kodama , Tomotaka Tsuchimura , Hiroshi Saegusa , Hideaki Tsubaki
- Applicant: Kunihiko Kodama , Tomotaka Tsuchimura , Hiroshi Saegusa , Hideaki Tsubaki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-287220 20061023
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30
Abstract:
The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
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