Invention Grant
- Patent Title: Phase change memory device and method for manufacturing the same
- Patent Title (中): 相变存储器件及其制造方法
-
Application No.: US12359431Application Date: 2009-01-26
-
Publication No.: US07799596B2Publication Date: 2010-09-21
- Inventor: Heon Yong Chang , Suk Kyoung Hong , Hae Chan Park
- Applicant: Heon Yong Chang , Suk Kyoung Hong , Hae Chan Park
- Applicant Address: KR Kyoungki-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Kyoungki-do
- Agency: Ladas & Parry LLP
- Priority: KR10-2005-0049784 20050610
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A phase change memory device reduces the current necessary to cause a phase change of a phase change layer. The phase change memory device includes a first oxide layer formed on a semiconductor substrate; a lower electrode formed inside the first oxide layer; a second oxide layer formed on the first oxide layer including the lower electrode, the second oxide having a hole for exposing a part of the lower electrode; a phase change layer formed on a surface of the hole with a uniform thickness so as to make contact with the lower electrode; and an upper electrode formed in the hole and on a part of the second oxide layer, the part being adjacent to the hole.
Public/Granted literature
- US20090137080A1 PHASE CHANGE MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2009-05-28
Information query
IPC分类: