Invention Grant
US07799883B2 Norbornene-type polymers, compositions thereof and lithographic process using such compositions
有权
降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
- Patent Title: Norbornene-type polymers, compositions thereof and lithographic process using such compositions
- Patent Title (中): 降冰片烯型聚合物，其组合物和使用这种组合物的平版印刷方法
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Application No.: US11359880Application Date: 2006-02-22
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Publication No.: US07799883B2Publication Date: 2010-09-21
- Inventor: Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
- Applicant: Larry F. Rhodes , Chun Chang , Pramod Kandanarachchi , Lawrence D. Seger , Keita Ishiduka , Kotaro Endo , Tomoyuki Ando
- Applicant Address: US OH Brecksville
- Assignee: Promerus LLC
- Current Assignee: Promerus LLC
- Current Assignee Address: US OH Brecksville
- Agency: The Webb Law Firm
- Main IPC: C08F32/08
- IPC: C08F32/08 ; G03F7/11 ; G03F7/038 ; H01L23/48
Abstract:
Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.
Public/Granted literature
- US20060234164A1 Norbornene-type polymers, compositions thereof and lithographic process using such compositions Public/Granted day:2006-10-19
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