Invention Grant
US07800091B2 Nonvolatile semiconductor memory device and manufacturing method thereof 失效
非易失性半导体存储器件及其制造方法

Nonvolatile semiconductor memory device and manufacturing method thereof
Abstract:
A nonvolatile semiconductor memory device includes a first stacked structure in which a plurality of electrode layers are stacked on a substrate via insulating layers, a first resistance changing layer provided on a side surface of the first stacked structure and in contact with the first electrode layers, the first resistance changing layer having a resistance value changing on the basis of an applied voltage, a second electrode layer provided on a side surface of the first resistance changing layer, and a bit line provided on the first stacked structure and electrically connected to the second electrode layer.
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