Invention Grant
- Patent Title: Semiconductor electrostatic protection device
- Patent Title (中): 半导体静电保护装置
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Application No.: US11757448Application Date: 2007-06-04
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Publication No.: US07800180B2Publication Date: 2010-09-21
- Inventor: Atsushi Watanabe , Yasuhisa Ishikawa
- Applicant: Atsushi Watanabe , Yasuhisa Ishikawa
- Applicant Address: JP Tokyo
- Assignee: Mitsumi Electric Co., Ltd.
- Current Assignee: Mitsumi Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Ladas & Parry LLP
- Priority: JP2006-180227 20060629
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
A semiconductor device is disclosed. The semiconductor device includes an internal circuit having a high breakdown voltage transistor, and a first electrostatic protection circuit in which electrostatic protection elements are connected in series. The sum of the breakdown voltage values of the electrostatic protection elements in the first electrostatic protection circuit is almost equal to the breakdown voltage value of the high breakdown voltage transistor. The first electrostatic protection circuit is connected between an input/output terminal and a ground terminal of the semiconductor device to which terminals the internal circuit is connected.
Public/Granted literature
- US20080001229A1 SEMICONDUCTOR DEVICE Public/Granted day:2008-01-03
Information query
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