Invention Grant
- Patent Title: Closed trench MOSFET with floating trench rings as termination
- Patent Title (中): 封闭沟槽MOSFET作为端接浮动沟槽环
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Application No.: US11699256Application Date: 2007-01-28
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Publication No.: US07800185B2Publication Date: 2010-09-21
- Inventor: Fwu-Iuan Hshieh
- Applicant: Fwu-Iuan Hshieh
- Applicant Address: KY
- Assignee: Force-MOS Technology Corp.
- Current Assignee: Force-MOS Technology Corp.
- Current Assignee Address: KY
- Agent Bo-In Lin
- Main IPC: H01L27/088
- IPC: H01L27/088

Abstract:
A semiconductor power device includes a plurality of closed N-channel MOSFET cells surrounded by trenched gates constituting substantially a square or rectangular cell. The trenched gates are further extended to a gate contact area and having greater width as wider trenched gates for electrically contacting a gate pad wherein the semiconductor power device further includes a source region disposed only in regions near the trenched gates in the closed N-channel MOSFET cells and away from regions near the wider trenched gate whereby a device ruggedness is improved. The source region is further disposed at a distance away from a corner or an edge of the semiconductor power device and away from a termination area. The semiconductor device further includes multiple trenched rings disposed in a termination area opposite the active area and the trenched rings having a floating voltage. The closed N-channel MOSFET cells are further supported on a red phosphorous substrate.
Public/Granted literature
- US20080179662A1 Closed trench MOSFET with floating trench rings as termination Public/Granted day:2008-07-31
Information query
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