Invention Grant
US07800201B2 Thinned wafer having stress dispersion parts and method for manufacturing semiconductor package using the same 失效
具有应力分散部件的薄片晶片及其制造方法

  • Patent Title: Thinned wafer having stress dispersion parts and method for manufacturing semiconductor package using the same
  • Patent Title (中): 具有应力分散部件的薄片晶片及其制造方法
  • Application No.: US12043478
    Application Date: 2008-03-06
  • Publication No.: US07800201B2
    Publication Date: 2010-09-21
  • Inventor: Sung Ho Hyun
  • Applicant: Sung Ho Hyun
  • Applicant Address: KR Kyoungki-do
  • Assignee: Hynix Semiconductor Inc.
  • Current Assignee: Hynix Semiconductor Inc.
  • Current Assignee Address: KR Kyoungki-do
  • Agency: Ladas & Parry LLP
  • Priority: KR10-2007-0063263 20070626
  • Main IPC: H01L29/06
  • IPC: H01L29/06
Thinned wafer having stress dispersion parts and method for manufacturing semiconductor package using the same
Abstract:
A thinned wafer having stress dispersion parts that make the wafer resistant to warpage and a method for manufacturing a semiconductor package using the same is described. The wafer includes a wafer body having a semiconductor chip forming zone and a peripheral zone located around the semiconductor chip forming zone; and the stress dispersion parts are located in the peripheral zone so as to disperse stress induced in the peripheral zone and the semiconductor chip forming zone.
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