Invention Grant
- Patent Title: MEMS device and fabrication method of the same
- Patent Title (中): MEMS器件及其制造方法相同
-
Application No.: US11873008Application Date: 2007-10-16
-
Publication No.: US07800280B2Publication Date: 2010-09-21
- Inventor: Hee-moon Jeong , Jin-woo Cho , Yong-hwa Park , Jun-o Kim , Seok-mo Chang
- Applicant: Hee-moon Jeong , Jin-woo Cho , Yong-hwa Park , Jun-o Kim , Seok-mo Chang
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electro-Mechanics Co., Ltd
- Current Assignee: Samsung Electro-Mechanics Co., Ltd
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2007-0007915 20070125
- Main IPC: H02N1/00
- IPC: H02N1/00

Abstract:
A microelectromechanical systems (MEMS) device includes a frame, an actuator formed on the same layer as the frame and connected to the frame to be capable of performing a relative motion with respect to the frame, and at least one stopper restricting a displacement of the actuator in a direction along the height of the actuator. The MEMS device is fabricated by bonding a second substrate to a first substrate, forming the frame and the actuator by partially removing the first substrate, and forming the at least one stopper by partially removing the second substrate.
Public/Granted literature
- US20080179988A1 MEMS DEVICE AND FABRICATION METHOD OF THE SAME Public/Granted day:2008-07-31
Information query