Invention Grant
US07800734B2 Lighting apparatus, exposure apparatus and microdevice manufacturing method
有权
照明装置,曝光装置和微型装置制造方法
- Patent Title: Lighting apparatus, exposure apparatus and microdevice manufacturing method
- Patent Title (中): 照明装置,曝光装置和微型装置制造方法
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Application No.: US11660927Application Date: 2005-09-21
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Publication No.: US07800734B2Publication Date: 2010-09-21
- Inventor: Hideki Komatsuda
- Applicant: Hideki Komatsuda
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2004-275048 20040922
- International Application: PCT/JP2005/017346 WO 20050921
- International Announcement: WO2006/033336 WO 20060330
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/68 ; G03B27/42 ; G03B27/52

Abstract:
An illumination apparatus for illuminating a surface (M) to be irradiated with illumination light emitted from a light source (2) comprises a reflection type fly-eye optical systems (12, 14) disposed between the light source (2) and the surface (M) to be irradiated and constituted by a plurality of reflection partial optical systems for wavefront-dividing a light beam from the light source (2) and superposing divided portions of the light beam onto each other on the surface (M) to be irradiated and a reflection type optical system (10) disposed between the light source (2) and the reflection type fly-eye optical systems (12, 14) for guiding the illumination light to the reflection type fly-eye optical systems (12, 14). The reflection type optical system (10) has a reflecting surface at least partly constructed by a diffusing surface.
Public/Granted literature
- US20090002662A1 Lighting Apparatus, Exposure Apparatus And Microdevice Manufacturing Method Public/Granted day:2009-01-01
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