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US07800761B2 Infrared interferometric-spatial-phase imaging using backside wafer marks 有权
使用背面晶片标记的红外干涉 - 空间相位成像

Infrared interferometric-spatial-phase imaging using backside wafer marks
Abstract:
An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in the substrate wafer. The alignment configuration uses a global coordinate reference system by providing a plurality of global reference marks that encompass up to the entire substrate wafer. A plurality of alignment markings is provided on a surface in close proximity to the alignment configuration for obtaining continuous six-axis control of a scanning probe tip with respect to the global coordinate reference system.
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