Invention Grant
- Patent Title: Methodology for substrate fluorescent non-overlapping dot design patterns for embedding information in printed documents
- Patent Title (中): 用于在印刷文件中嵌入信息的底物荧光非重叠点设计模式的方法
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Application No.: US11754733Application Date: 2007-05-29
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Publication No.: US07800785B2Publication Date: 2010-09-21
- Inventor: Raja Bala , Reiner Eschbach , Shen-Ge Wang , Yonghui Zhao
- Applicant: Raja Bala , Reiner Eschbach , Shen-Ge Wang , Yonghui Zhao
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: Fay Sharpe LLP
- Main IPC: H04N1/405
- IPC: H04N1/405

Abstract:
The teachings as provided herein relate to a watermark embedded in an image, and methodology for same, that has the property of being relatively indecipherable under normal light, and yet decipherable under UV light. This fluorescent mark comprises a substrate containing optical brightening agents, and a first dot design printed as an image upon the substrate. The first dot design has as a characteristic, the property of strongly suppressing substrate fluorescence. A second dot design having a property of providing a differing level of substrate fluorescence suppression from that of the first dot design such that when rendered in close spatial proximity with the first dot design image print, the resultant image rendered substrate suitably exposed to an ultra-violet light source, will yield a discernable image evident as a fluorescent mark.
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