Invention Grant
- Patent Title: Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device
- Patent Title (中): 空间光调制装置，光刻装置，显示装置，具有空间光图案的光束的制造方法及制造装置的方法
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Application No.: US11914349Application Date: 2006-05-08
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Publication No.: US07800811B2Publication Date: 2010-09-21
- Inventor: Erik Jan Lous
- Applicant: Erik Jan Lous
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP05104008 20050513
- International Application: PCT/IB2006/051437 WO 20060508
- International Announcement: WO2006/120634 WO 20061116
- Main IPC: G02B26/00
- IPC: G02B26/00 ; G03B27/42
Abstract:
The spatial light modulator device (SLM) for providing a spatial light pattern which is alterable in response to an electric signal comprises a first modulator element (ME1) and a second modulator element (ME2). The first light beam (LB1) processed by the first modulator element (ME1) and the second light beam (LB2) processed by the second modulator element (ME2) can be superimposed for forming the spatial light pattern. In this way a defect in the first modulator element (ME1) can be compensated a corresponding pixel of the second modulator element (ME2). The spatial light pattern provided by the first modulator element (ME1) and the second modulator element (ME2) are complementary and combine to the desired spatial light pattern. The spatial light modulator device (SLM) may be used in a lithography apparatus (LA) or a display device (DD).
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