Invention Grant
- Patent Title: X-ray diffraction apparatus and X-ray diffraction method
- Patent Title (中): X射线衍射装置和X射线衍射法
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Application No.: US12190790Application Date: 2008-08-13
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Publication No.: US07801272B2Publication Date: 2010-09-21
- Inventor: Hideo Toraya
- Applicant: Hideo Toraya
- Applicant Address: JP Akishima-shi
- Assignee: Rigaku Corporation
- Current Assignee: Rigaku Corporation
- Current Assignee Address: JP Akishima-shi
- Agency: Frishauf, Holtz, Goodman & Chick, P.C.
- Priority: JP2007-253394 20070928; JP2007-253425 20070928
- Main IPC: G01N23/20
- IPC: G01N23/20 ; G21K1/06

Abstract:
In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror has a shape of an equiangular spiral that has a center located on the surface of the sample. A crystal lattice plane that causes reflection is parallel to the reflective surface at any point on the reflective surface. The X-ray detector is one-dimensional position sensitive in a plane parallel to the diffraction plane. A relative positional relationship between the mirror and the X-ray detector is determined so that reflected X-rays from different points on the reflective surface of the mirror reach different points on the X-ray detector respectively. This X-ray diffraction method is superior in angular resolution, and is small in X-ray intensity reduction, and is simple in structure.
Public/Granted literature
- US20090086921A1 X-RAY DIFFRACTION APPARATUS AND X-RAY DIFFRACTION METHOD Public/Granted day:2009-04-02
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