Invention Grant
- Patent Title: Method for defect detection using computer aided design data
- Patent Title (中): 使用计算机辅助设计数据进行缺陷检测的方法
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Application No.: US11669809Application Date: 2007-01-31
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Publication No.: US07801353B2Publication Date: 2010-09-21
- Inventor: Gilad Almogy , Benyamin Buller
- Applicant: Gilad Almogy , Benyamin Buller
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel, Ltd.
- Current Assignee: Applied Materials Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Sonnenschein Nath & Rosenthal LLP
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
Images of areas of a wafer are generated and registered with respect to computer aided design (CAD) data to provide a registered images. Defects in the wafer are then detected by comparing the registered images to one another and defect location information is generated in CAD coordinates.
Public/Granted literature
- US20070280527A1 METHOD FOR DEFECT DETECTION USING COMPUTER AIDED DESIGN DATA Public/Granted day:2007-12-06
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