Invention Grant
- Patent Title: Generating a model using global node optimization
- Patent Title (中): 使用全局节点优化生成模型
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Application No.: US11561245Application Date: 2006-11-17
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Publication No.: US07801713B1Publication Date: 2010-09-21
- Inventor: Carlos L. Ygartua , Leonid Poslavsky
- Applicant: Carlos L. Ygartua , Leonid Poslavsky
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Agent Jeanette S. Harms
- Main IPC: G06G7/48
- IPC: G06G7/48 ; G06F17/50

Abstract:
A global node optimization (GNO) technique can generate a model for a planar multiple layer film stack structure, e.g. a binary grating structure. In this technique, after obtaining spectra and target thicknesses from one or more wafers, a continuous film approximation (CFA) and a grating factor (GF) set are identified. A model using the CFA and the GF set is optimized by simultaneously fitting a plurality of the spectra while minimizing error compared to the target thicknesses. After simultaneously fitting all of the spectra, a GNO stack is created. A GNO recipe is then created using the GNO stack. Notably, a tool implementing the GNO technique uses minimal modeling capabilities and computational resources.
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