Invention Grant
US07802517B2 Method of patterning molecules on a substrate using a micro-contact printing process
有权
使用微接触印刷方法在基底上图案化分子的方法
- Patent Title: Method of patterning molecules on a substrate using a micro-contact printing process
- Patent Title (中): 使用微接触印刷方法在基底上图案化分子的方法
-
Application No.: US11477655Application Date: 2006-06-30
-
Publication No.: US07802517B2Publication Date: 2010-09-28
- Inventor: Jurina Wessels , Gregor Kron , Akio Yasuda , Daniel Schwaab , Dirk Mayer , Andreas Offenhaeusser
- Applicant: Jurina Wessels , Gregor Kron , Akio Yasuda , Daniel Schwaab , Dirk Mayer , Andreas Offenhaeusser
- Applicant Address: DE Cologne
- Assignee: Sony Deutschland GmbH
- Current Assignee: Sony Deutschland GmbH
- Current Assignee Address: DE Cologne
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: EP05023880 20051102
- Main IPC: B41M3/00
- IPC: B41M3/00
Abstract:
The present invention relates to a method of patterning molecules on a substrate using a micro-contact printing process, to a substrate produced by said method and to uses of said substrate. It also relates to a device for performing the method according to the present invention.
Public/Granted literature
- US20070098899A1 Method of patterning molecules on a substrate using a micro-contact printing process Public/Granted day:2007-05-03
Information query
