Invention Grant
US07803231B2 Substrate edge part cleaning apparatus and substrate edge part cleaning method
有权
基板边缘部件清洁装置和基板边缘部件清洁方法
- Patent Title: Substrate edge part cleaning apparatus and substrate edge part cleaning method
- Patent Title (中): 基板边缘部件清洁装置和基板边缘部件清洁方法
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Application No.: US11632150Application Date: 2005-08-01
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Publication No.: US07803231B2Publication Date: 2010-09-28
- Inventor: Ryouichirou Katano , Shinjiro Tsuji
- Applicant: Ryouichirou Katano , Shinjiro Tsuji
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2004-257553 20040903
- International Application: PCT/JP2005/014479 WO 20050801
- International Announcement: WO2006/027919 WO 20060316
- Main IPC: B08B7/00
- IPC: B08B7/00

Abstract:
A substrate edge part cleaning apparatus judging a cleaning degree of glass substrates when cleaning edge parts of the glass substrates used for liquid crystal display. The substrate edge part cleaning apparatus 100 having a cleaning head wiping an edge part of a substrate for display A while moving rectilinearly, and having a camera 117 capturing images of the proximity of an edge of a color filter which is placed on the substrate, by moving together with the cleaning head. The camera 117 obtains surface status information of the substrate part which has been cleaned, and the substrate edge part cleaning apparatus 100 further includes a cleaning degree judgment unit 306 judging a cleaning degree based on the surface status information.
Public/Granted literature
- US20070181152A1 Substrate edge part cleaning apparatus and substrate edge part cleaning method Public/Granted day:2007-08-09
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