Invention Grant
- Patent Title: Surface treated shape memory materials and methods for making same
- Patent Title (中): 表面处理形状记忆材料及其制作方法
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Application No.: US11331264Application Date: 2006-01-11
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Publication No.: US07803234B2Publication Date: 2010-09-28
- Inventor: Kelvin W. K. Yeung , Ray W. Y. Poon , Paul Kim-Ho Chu , Kenneth M. C. Cheung , William W. Lu
- Applicant: Kelvin W. K. Yeung , Ray W. Y. Poon , Paul Kim-Ho Chu , Kenneth M. C. Cheung , William W. Lu
- Applicant Address: CN Hong Kong
- Assignee: Versitech Limited,The City University of Hong Kong
- Current Assignee: Versitech Limited,The City University of Hong Kong
- Current Assignee Address: CN Hong Kong
- Agency: Saliwanchik, Lloyd & Saliwanchik
- Main IPC: C23C8/36
- IPC: C23C8/36
Abstract:
The invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.
Public/Granted literature
- US20060157159A1 Surface treated shape memory materials and methods for making same Public/Granted day:2006-07-20
Information query
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