Invention Grant
- Patent Title: Al—Ni-rare earth element alloy sputtering target
- Patent Title (中): Al-Ni-稀土元素合金溅射靶
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Application No.: US11341531Application Date: 2006-01-30
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Publication No.: US07803238B2Publication Date: 2010-09-28
- Inventor: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
- Applicant: Toshihiro Kugimiya , Katsutoshi Takagi , Hitoshi Matsuzaki , Kotaro Kitashita , Yoichiro Yoneda
- Applicant Address: JP Kobe-shi JP Kobe-shi
- Assignee: Kobe Steel, Ltd.,Kobelco Research Institute, Inc.
- Current Assignee: Kobe Steel, Ltd.,Kobelco Research Institute, Inc.
- Current Assignee Address: JP Kobe-shi JP Kobe-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-037937 20050215
- Main IPC: C22C21/00
- IPC: C22C21/00

Abstract:
An Al-base alloy sputtering target consisting Ni and one or more rare earth elements, wherein there are 5.0×104/mm2 or more compounds whose aspect ratio is 2.5 or higher and whose equivalent diameter is 0.2 μm or larger, when a cross sectional surface perpendicular to the plane of the target is observed at a magnification of 2000 or higher.
Public/Granted literature
- US20060180250A1 Al-Ni-rare earth element alloy sputtering target Public/Granted day:2006-08-17
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