Invention Grant
US07803344B2 Method for growing group III-nitride crystals in a mixture of supercritical ammonia and nitrogen, and group III-nitride crystals grown thereby
有权
在超临界氨和氮的混合物中生长III族氮化物晶体的方法以及由此生长的III族氮化物晶体
- Patent Title: Method for growing group III-nitride crystals in a mixture of supercritical ammonia and nitrogen, and group III-nitride crystals grown thereby
- Patent Title (中): 在超临界氨和氮的混合物中生长III族氮化物晶体的方法以及由此生长的III族氮化物晶体
-
Application No.: US11977661Application Date: 2007-10-25
-
Publication No.: US07803344B2Publication Date: 2010-09-28
- Inventor: Tadao Hashimoto
- Applicant: Tadao Hashimoto
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Gates & Cooper LLP
- Main IPC: C01B21/06
- IPC: C01B21/06

Abstract:
A method of growing group III-nitride crystals in a mixture of supercritical ammonia and nitrogen, and the group-III crystals grown by this method. The group III-nitride crystal is grown in a reaction vessel in supercritical ammonia using a source material or nutrient that is polycrystalline group III-nitride, amorphous group III-nitride, group-III metal or a mixture of the above, and a seed crystal that is a group-III nitride single crystal. In order to grow high-quality group III-nitride crystals, the crystallization temperature is set at 550° C. or higher. Theoretical calculations show that dissociation of NH3 at this temperature is significant. However, the dissociation of NH3 is avoided by adding extra N2 pressure after filling the reaction vessel with NH3.
Public/Granted literature
Information query