Invention Grant
US07803419B2 Apparatus and method for rapid cooling of large area substrates in vacuum
有权
在真空中快速冷却大面积基板的装置和方法
- Patent Title: Apparatus and method for rapid cooling of large area substrates in vacuum
- Patent Title (中): 在真空中快速冷却大面积基板的装置和方法
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Application No.: US11525456Application Date: 2006-09-22
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Publication No.: US07803419B2Publication Date: 2010-09-28
- Inventor: Kurt L. Barth , Robert A. Enzenroth , Walajabad S. Sampath
- Applicant: Kurt L. Barth , Robert A. Enzenroth , Walajabad S. Sampath
- Applicant Address: US CO Loveland
- Assignee: Abound Solar, Inc.
- Current Assignee: Abound Solar, Inc.
- Current Assignee Address: US CO Loveland
- Agency: Cooley LLP
- Main IPC: C23C16/52
- IPC: C23C16/52 ; B05D3/00

Abstract:
The present invention is directed to an apparatus and method for rapid cooling of a large substrate in a vacuum environment. A first cooled plate is brought into close proximity with one surface of a flat substrate. The spatial volume between the first cooling plate and the substrate is sealed and brought to a higher pressure than the surrounding vacuum level to increase the cooling efficiency. A second cooled plate is brought into close proximity with the opposite surface of the flat substrate. A second spatial volume between the second cooling plate and the substrate is sealed and the gas pressure is equalized to the gas pressure in the first spatial volume. The equalization of the gas pressure on both sides of the flat substrate eliminates deflection of the substrate and bending stress in the substrate.
Public/Granted literature
- US20080075853A1 Apparatus and method for rapid cooling of large area substrates in vacuum Public/Granted day:2008-03-27
Information query
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