Invention Grant
- Patent Title: Positive photosensitive polybenzoxazole precursor compositions
- Patent Title (中): 正光敏聚苯并恶唑前体组合物
-
Application No.: US11500251Application Date: 2006-08-07
-
Publication No.: US07803510B2Publication Date: 2010-09-28
- Inventor: Ahmad A. Naiini , David B. Powell , Donald W. Racicot , Il'ya Rushkin , William D. Weber
- Applicant: Ahmad A. Naiini , David B. Powell , Donald W. Racicot , Il'ya Rushkin , William D. Weber
- Applicant Address: US RI North Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI North Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: G03F7/30
- IPC: G03F7/30
Abstract:
A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
Public/Granted literature
- US20070099111A1 Novel positive photosensitive polybenzoxazole precursor compositions Public/Granted day:2007-05-03
Information query
IPC分类:
