Invention Grant
- Patent Title: Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof
- Patent Title (中): 光敏组合物，使用其的微细加工方法及其微结构
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Application No.: US12230221Application Date: 2008-08-26
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Publication No.: US07803514B2Publication Date: 2010-09-28
- Inventor: Jong Jin Park
- Applicant: Jong Jin Park
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2008-0014796 20080219
- Main IPC: G03C1/76
- IPC: G03C1/76 ; G03C1/492 ; G03C1/494 ; G03C5/00 ; G03C5/44
Abstract:
Disclosed herein may be a photosensitive composition, a microfabricated structure including the same, a device including the microfabricated structure, and methods of fabricating the microfabricated structure and the device. The photosensitive composition, including a multifunctional photosensitive resin, a two-photon photosensitizer, an organic solvent, and a silver compound, may be subjected to two- or three-dimensional microfabrication, thus realizing the microfabricated structure containing silver nanoparticles.
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