Invention Grant
- Patent Title: Phase change memory cell including a thermal protect bottom electrode and manufacturing methods
- Patent Title (中): 相变存储单元包括热保护底电极和制造方法
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Application No.: US11940164Application Date: 2007-11-14
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Publication No.: US07804083B2Publication Date: 2010-09-28
- Inventor: Shih-Hung Chen
- Applicant: Shih-Hung Chen
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: H01L47/00
- IPC: H01L47/00 ; H01L29/04 ; H01L31/036

Abstract:
Memory devices are described along with manufacturing methods. An embodiment of a memory device as described herein includes a bottom electrode, a thermal protect structure on the bottom electrode, and a multi-layer stack on the thermal protect structure. The thermal protect structure comprises a layer of thermal protect material, the thermal protect material having a thermal conductivity less than that of the bottom electrode material.
Public/Granted literature
- US20090122588A1 PHASE CHANGE MEMORY CELL INCLUDING A THERMAL PROTECT BOTTOM ELECTRODE AND MANUFACTURING METHODS Public/Granted day:2009-05-14
Information query
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