Invention Grant
- Patent Title: Integrated semiconductor diode arrangement and integrated semiconductor component
- Patent Title (中): 集成半导体二极管布置和集成半导体元件
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Application No.: US11042928Application Date: 2005-01-25
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Publication No.: US07804135B2Publication Date: 2010-09-28
- Inventor: Nils Jensen , Andreas Meiser
- Applicant: Nils Jensen , Andreas Meiser
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Dicke, Billig & Czaja, PLLC
- Priority: DE102004004862 20040130
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
An integrated semiconductor diode arrangement is provided. The arrangement includes an anode region and a cathode region that are formed in a semiconductor material region. The anode region has an arrangement of alternately occurring and directly adjacent first and second anode zones, which alternate in their conductivity type. The anode region furthermore has a first particular anode zone of the second conductivity type, the lateral extent of which is comparatively larger than that of the further anode zones of the same conductivity type.
Public/Granted literature
- US20050189564A1 Integrated semiconductor diode arrangement and integrated semiconductor component Public/Granted day:2005-09-01
Information query
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