Invention Grant
- Patent Title: Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer
- Patent Title (中): 光热掩模包括对准的热耗散层，反射层和透明覆盖层
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Application No.: US11355799Application Date: 2006-02-16
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Publication No.: US07804148B2Publication Date: 2010-09-28
- Inventor: Louis L. Hsu , Jack A. Mandelman , Chandrasekhar Narayan , Chun-Yung Sung
- Applicant: Louis L. Hsu , Jack A. Mandelman , Chandrasekhar Narayan , Chun-Yung Sung
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Thomas A. Beck; Daniel P. Morris
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L31/058 ; H01L31/02 ; H01L31/0232 ; H01L31/024 ; H01L21/033 ; H01L21/00
Abstract:
An opto-thermal annealing mask stack layer includes a thermal dissipative layer located over a substrate. A reflective layer is located upon the thermal dissipative layer. A transparent capping layer, that may have a thickness from about 10 to about 100 angstroms, is located upon the reflective layer. The opto-thermal annealing mask layer may be used as a gate electrode within a field effect device.
Public/Granted literature
- US20070187670A1 Opto-thermal annealing mask and method Public/Granted day:2007-08-16
Information query
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