Invention Grant
US07804207B2 Positioning apparatus, exposure apparatus, and device manufacturing method using repulsion force generation 失效
使用排斥力产生的定位装置,曝光装置和装置制造方法

Positioning apparatus, exposure apparatus, and device manufacturing method using repulsion force generation
Abstract:
This invention provides a positioning apparatus which improves the throughput by accelerating a stage in a shorter period of time while ensuring a fine positioning characteristic. A movable element is arranged on the side of a stage while a stator is arranged on the side of a base guide such that a pair of magnets of the same polarity face each other at each edge of the stroke region of the stage. This generates a repulsion force which acts against the thrust of the stage and corresponds to the facing area of the pair of magnets of the same polarity. The positioning apparatus further includes a large-thrust linear motor. The large-thrust linear motor assists the repulsion force by applying a thrust exceeding the repulsion force to the stage to increase the facing area of the pair of magnets of the same polarity.
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