Invention Grant
- Patent Title: Positioning apparatus, exposure apparatus, and device manufacturing method using repulsion force generation
- Patent Title (中): 使用排斥力产生的定位装置,曝光装置和装置制造方法
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Application No.: US11874482Application Date: 2007-10-18
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Publication No.: US07804207B2Publication Date: 2010-09-28
- Inventor: Yugo Shibata
- Applicant: Yugo Shibata
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-293154 20061027
- Main IPC: H02K41/03
- IPC: H02K41/03 ; H02K41/00

Abstract:
This invention provides a positioning apparatus which improves the throughput by accelerating a stage in a shorter period of time while ensuring a fine positioning characteristic. A movable element is arranged on the side of a stage while a stator is arranged on the side of a base guide such that a pair of magnets of the same polarity face each other at each edge of the stroke region of the stage. This generates a repulsion force which acts against the thrust of the stage and corresponds to the facing area of the pair of magnets of the same polarity. The positioning apparatus further includes a large-thrust linear motor. The large-thrust linear motor assists the repulsion force by applying a thrust exceeding the repulsion force to the stage to increase the facing area of the pair of magnets of the same polarity.
Public/Granted literature
- US20080100149A1 POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2008-05-01
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