Invention Grant
- Patent Title: Epitaxial oxide film, piezoelectric film, piezoelectric film element, liquid discharge head using the piezoelectric film element, and liquid discharge apparatus
- Patent Title (中): 外延氧化膜,压电膜,压电膜元件,使用压电膜元件的液体排出头以及液体排出装置
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Application No.: US11677267Application Date: 2007-02-21
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Publication No.: US07804231B2Publication Date: 2010-09-28
- Inventor: Toshihiro Ifuku , Katsumi Aoki , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama , Yong Kwan Kim , Hiroshi Nakaki , Rikyu Ikariyama
- Applicant: Toshihiro Ifuku , Katsumi Aoki , Takanori Matsuda , Hiroshi Funakubo , Shintaro Yokoyama , Yong Kwan Kim , Hiroshi Nakaki , Rikyu Ikariyama
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Canon Kabushiki Kaisha,Tokyo Institute of Technology
- Current Assignee: Canon Kabushiki Kaisha,Tokyo Institute of Technology
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2005-257133 20050905; JP2006-076667 20060320; JP2006-231238 20060828
- Main IPC: H01L41/187
- IPC: H01L41/187

Abstract:
Provided are a piezoelectric film, a piezoelectric film element, a liquid discharge head using the piezoelectric film element, and a liquid discharge apparatus. A piezoelectric film element that can be suitably used for a discharge pressure-generating element of a liquid discharge head is obtained by using an epitaxial oxide film composed of a perovskite composite oxide constituted according to a general formula ABO3 as a piezoelectric film. The epitaxial oxide film has at least an A domain and a B domain having a crystal orientation deviation with respect to each other. The crystal orientation deviation between the A domain and the B domain is less than 2°.
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