Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
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Application No.: US11391683Application Date: 2006-03-29
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Publication No.: US07804577B2Publication Date: 2010-09-28
- Inventor: Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
- Applicant: Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
Public/Granted literature
- US20070110213A1 Lithographic apparatus Public/Granted day:2007-05-17
Information query
