Invention Grant
- Patent Title: EUV reticle handling system and method
- Patent Title (中): EUV掩模版处理系统和方法
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Application No.: US12242050Application Date: 2008-09-30
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Publication No.: US07804583B2Publication Date: 2010-09-28
- Inventor: Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
- Applicant: Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
- Applicant Address: JP
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G03B27/52
Abstract:
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
Public/Granted literature
- US20090027639A1 EUV Reticle Handling System and Method Public/Granted day:2009-01-29
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